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Abstract: A low temperature (300°C–350°C) TiN thermal ALD process using titanium tetrachloride (TiCl 4) and anhydrous hydrazine was developed to yield films with resistivities below 200 μohm-cm.

Next to a pair of boots, a reliable winter coat is a must when braving the cold. They keep you dry like your go-to rain jacket but are lined with down insulation or cozy fleece to trap heat. A good ...

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