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Abstract: Resist line edge roughness (LER) is generally regarded as noise residues accumulated in every lithography processing step. Current state of art LER simulators model the physical causes of ...
You can find the latest release here. $ cat test/square.txt (COLOR 1) ; red (SOLID_FILL_POLYGON 10 10 10 190 190 190 190 10) (COLOR 2) ; yellow (SOLID_FILL_POLYGON 20 20 20 180 180 180 180 20) (COLOR ...
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I drew for 1 hour using only one continuous line
One pen. One line. No breaks. In this wild drawing challenge, I attempt the impossible: creating an entire piece of art using only ONE continuous line… for a full hour. No lifting the pen, no undo ...
Abstract: Perception algorithms are ubiquitous in modern autonomy stacks, providing necessary environmental information to operate in the real world. Many of these algorithms depend on the visibility ...
Creative Commons (CC): This is a Creative Commons license. Attribution (BY): Credit must be given to the creator. Article Views are the COUNTER-compliant sum of full text article downloads since ...
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